Estudio de Películas Delgadas Cristalinas de TiN Crecidas Mediante Sputtering por Magnetrón en Modo Reactivo

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Javier García Molleja

Bernardo José Gómez



Resumen

Resumen: El nitruro de titanio (TiN) es un compuesto de gran aplicabilidad. Abarca campos tales como los circuitos integrados y los implantes ortopédicos. Por tanto, es vital conocer la cinética de crecimiento del TiN y la influencia del sustrato. En este artículo se depositó una película delgada de TiN bajo parámetros experimentales fijos para conocer las propiedades de dicha película, estudiadas mediante GIXRD, SEM, AFM, EDS y aniquilación de positrones para ver los defectos en la estructura. Los estudios determinaron que la película de TiN tuvo una textura (200) y era lisa. El óxido nativo SiO2 hizo desarrollar la película en tres estratos: uno interno de Ti-SiO2, otro de TiNpolicristalino y otro grueso en la superficie muy texturado, también de TiN.

Abstract: Titanium nitride (TiN) is a compound with many applications in industry, e.g., integrated circuits and orthopedic implants. Because of this, it is very important to know the kinetic growth of thin TiN films and the influence of the substrate. In this paper a thin TiN film was deposited under selected experimental parameters in order to know the film properties. GIXRD, SEM, AFM and EDS techniques were carried on. Furthermore, with positron annihilation structural defects can be revealed. Analyses showed that the TiN film is polycrystalline with (200) texture and smooth. The substrate influence (mainly the native SiO2) develops three layers: an inner one formed by Ti bonded with SiO2, an interlayer with polycrystalline TiN and a thick surface layer with textured TiN.


 


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Biografía del autor/a

Javier García Molleja, Escuela de Ciencias Físicas y Nanotecnología - Yachay Tech

Docente del Departamento de Física en Yachay Tech (2014, Ecuador)

Becado postdoctoral por el Institut des Matériaux Jean Rouxel (2013, Francia)

Becado postdoctoral por el Instituto de Física de Rosario (2012, Argentina)

Doctor en Física por la Universidad Nacional de Rosario (2012, Argentina)

Licenciado en Física por la Universidad de Córdoba (2006, España)

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